Hydrogen Peroxide is an oxidizing agent with disinfectant properties. The Hydrogen Peroxide, Semiconductor Grade is used in electronic industries for the cleaning of silicon wafers, and etching of printed circuit breakers. Such sensitive applications require ultra-purified Hydrogen Peroxide only that is mostly produced through reverse osmosis process. Metallic concentrations in Hydrogen Peroxide, Electronic Grade / Semiconductor Grade are in their parts per billion or trillion range. Lab Alley recommends to use its premium quality and highly pure 30% Hydrogen Peroxide in Electronic industries for cleaning and etching purposes.
- Electronics
- Metal etching
- Refrigerant
- Semiconductor chips
Product Information
| CAS | 7722-84-1 |
|---|---|
| Synonyms | Oxydol, Hydroperoxide, Perhydrol, Superoxol, Interox, Hydrogen Dioxide, Dihydrogen Dioxide, Inhibine, Peroxaan, Albone, Hioxyl, Kastone |
| Assay | 30 - 32 |
| PubChem ID | 784 |
| Grade | Semiconductor/Electronic Grade |
| Color | Max 10 |
| Physical form | Liquid |
| Appearance | Colorless |
| Odor | Odorless |
| pH | 2 - 4 @ 20 °C (68 °F) |
| Melting point | -27 °C (-17 °F) |
| Boiling Point | 106 °C (223 °F) |
| Vapor pressure | 17.4 - 25 mmHg |
| Density | 1.12 @ 20 - 25 °C (68 - 77 °F) |
| Molecular formula | H2O2 |
| Molecular weight | 34.01 |
| Arsenic (As) | 0.01 ppm |
| Autoship Available | No |
| Cadmium (Cd) | 1 ppm |
| Calcium (Ca) | 1 ppm |
| Chloride (Cl) | Max 500 |
| Clarity of Solution | Max 10 |
| Free Acid | 0.6 ueg/g |
| Heavy metals | Max 0.00005% |
| Iron (Fe) | Max 50 |
| Lead (Pb) | Max 20 |
| Magnesium (Mg) | 0.1 ppm |
| Phosphate (PO4) | Max 1000 |
| Residue after evaporation | Max 0.002% |
| Sodium (Na) | 1 ppm |
| Sulfate (SO4) | Max 2000 |
| Viscosity | 1.25 mPa.s |
